Interlayer introduced into silicon etching workflows enables unprecedented nanofabrication precision without structural damage

https://phys.org/news/2026-08-etching-method-silicon-higher-precision.html

"gas-phase metal-assisted chemical etching exhibits catalyst contamination/ pinning leading to structural defects, irregular patterning, porosity... overcome inserting protective chromium, aluminum oxide, or silicon dioxide interlayer enabling silicon surface cleaning prior to metal catalyst application... creates uniform, dense nanostructures covering up to 50% surface area with aspect ratios 250X taller than wide, improving microchip yield/ performance... sensors, semiconductor components, X-ray optics"