Thin-film survives harsh plasma etching and acts as a superior lithography mask, for smaller/ more advanced semiconductor chips

https://www.psu.edu/news/materials-research-institute/story/atom-thin-material-could-help-solve-chip-manufacturing-problem

"etching extremely deep/ narrow structures into silicon using high-energy plasma can damage masks patterning chips, distorting patterns... resolved using atomically thin 2-D material with very high-aspect-ratio structure for advanced chips... significantly improves fabrication of next-generation semiconductors by: maintaining sharp nanoscale patterns even in harsh processing conditions enabling smaller (supports Moore’s law), more precise chip features, improving manufacturing reliability"