Sensitive cationic epoxy photoresist with enhanced sensitivity/ speed: 3D nanofabrication for advanced microdevices

https://www.eurekalert.org/news-releases/1063193

"photon laser direct writing lithography... 600X greater sensitivity to 2-photon laser... 100 mm/s writing speed using nanolattices, fine features <200 nm, minimum width 170 nm... bimolecular photosensitized initiation separates light absorption/ energy transfer enhancing light absorption... captures light wavelengths down 430 nm... fabricated topological liquid diode with nanoscale features... optical gratings, diffraction elements, micro-electromechanical systems, microfluidic devices, tissue engineering scaffolds"