Advances in semiconductor patterning: New block copolymer achieves 7.6 nm line width

https://phys.org/news/2024-08-advances-semiconductor-patterning-block-copolymer.html

"improved integration/ miniaturization in semiconductor manufacturing... directed self-assembled compound arranges into perpendicular lamellar structures when applied as thin film without a top coating, half-pitch width <10 nm, outperforming conventional block copolymers... finer circuit patterns on semiconductor chips... refine repulsive interactions between different blocks in resulting polymer... promising templates for use in lithography in semiconductor manufacturing"

Related: Scientists develop eco-friendly microfabrication method using water and paper
https://techxplore.com/news/2024-08-scientists-eco-friendly-microfabrication-method.html