One-step, etch- free, high-resolution, large-area monolayer graphene patterning for low-resistance electrodes with feature sizes <5 µm

https://www.eurekalert.org/news-releases/1113662

"photolithography's chemical etching/ photoresists often cause lost lamination/ conductivity, overcome by selectively modifying chemical bonds without removing material... pre-etched glass substrate pressed against graphene under vacuum at 380°C, 1K volts applied causing alkali ion migration creating oxygen-rich zones that convert carbon–carbon bonds into carbon–oxygen bonds forming pattern... neural interfaces, solar cell/ advanced display transparent electrodes, flexible electronic skins/ health monitors"