Innovative photoresist materials pave the way for smaller, high performance semiconductor chips

https://techxplore.com/news/2023-11-photoresist-materials-pave-smaller-high.html

"resist is made using oganic thin film poly(methyl methacrylate) vapor-phase infiltrated with inorganic indium oxide... increased sensitivity to extreme ultraviolet (EUV) light (need less exposure time during lithograph patterning), improved uniformity, better patterning performance, and improved mechanical and chemical resistance so good templates for high-resolution etching... new classes hybrid photoresists and use machine learning in EUV research by making material validation easier and vastly cheaper"

Related: Everything machines always wanted to learn about metal-oxide-semiconductor capacitors
https://techxplore.com/news/2023-11-machines-metal-oxide-semiconductor-capacitors.html