Canon's nanoimprint litho tool could disrupt wafer fab equipment market
"cheaper 5nm-class chips... cost around $15 million, 1/10th that of ASML's EUV competing litho tool, although even Canon does not believe nanoimprint lithography will replace traditional EUV and DUV scanners... mold patterned with circuit design is stamped onto wafer resist, bypassing need for optical transfer, for more precise replication of intricate 2D or 3D circuit patterns in single step, but slower serial process, and requires stringent and ultra-clean process to ensure a uniform quality of production"
Related: Throwing lithography a curve: Research introduces mask wafer co-optimization method
https://phys.org/news/2024-02-lithography-mask-wafer-optimization-method.html
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