Study demonstrates atomic layer deposition route to scalable, electronic-grade van der Waals tellurium thin films

https://phys.org/news/2023-09-atomic-layer-deposition-route-scalable.html

"low-temperature, large-area, high-quality synthesis semiconductor deposition.. employed 2 acid-base precursors... co-reactants improve surface reactions and stability while adopting repeating dosing technique injecting precursors in shorter intervals... production of dense and continuous Te thin films... growth on 4-inch wafers, providing precise atomic layer-level precisely controlled thickness and uniform deposition... compatible with vertical 3D structures... transistors, rectifiers, and selection elements processes"

Related: A novel avenue for engineering 2D MXene family via precious metals atomic layer deposition techniques
https://phys.org/news/2024-01-avenue-2d-mxene-family-precious.html