Scientists improve near-field optical proximity correction via spatial modulation

https://phys.org/news/2023-04-scientists-near-field-optical-proximity-spatial.html

"diffraction limit of an evanescent-field-based patterning system... Precise OPC requires accurate exposure, so numerical calculations were performed to estimate the point spread function and quantitatively analyze the near-field enhancement effect and the size-dependence of the plasmonic near-field... fast and effective correcting evanescent-field-induced high-k information loss by exposure dose compensation in advance in exposure dose map... final pattern fidelity greatly improved"