Researchers developed a universal dual metal precursor method to grow non-layered 2D materials

https://phys.org/news/2022-08-universal-dual-metal-precursor-method.html

"In this dual metal growth method, the mixture of low-melting-point metal chloride and the corresponding high-melting-point metal powder was used as the dual-metal precursors. During the gas-phase reaction process, the evaporation rate was well controlled to provide a constant metal source feed and facilitate the growth of non-layered 2D TMCs with thin thickness. Taking hexagonal Fe1–xS as an example, the thickness is down to 3 nm with a lateral size up to >100 μm"