MOCVD tool to advance gallium-oxide semiconductor research

https://techxplore.com/news/2022-07-mocvd-tool-advance-gallium-oxide-semiconductor.html

"With this system, we can grow thin films on up to 2-inch-diameter substrates under widely tunable oxidation chemical potentials," said Nair. "It also has a very high substrate temperature capability and we can heat the substrate up to 1,500 degrees Celsius. High substrate temperatures yield better quality films which is key for pushing the performance of electronic devices"